Buy Fabric Fabric News Multi-field filtration application ptfe dust mask membrane

Multi-field filtration application ptfe dust mask membrane



The ptfe dust mask membrane is prepared using a unique biaxial stretching technology, which can ensure complete retention of bacteria and other impurities while having a large flux…

The ptfe dust mask membrane is prepared using a unique biaxial stretching technology, which can ensure complete retention of bacteria and other impurities while having a large flux.

The material is resistant to high temperatures, strong acids and alkali, and has wide chemical applicability. When used for gas filtration, it can achieve 100% retention of various phages, bacteria and particles above 0.02um.

The filtration efficiency of the ptfe dust mask membrane for bacteria and PM2.5 particles in the air can reach more than 95%, reaching the filtration standard of KN95 masks.

The extremely high porosity and ultra-thin thickness of <5μm give it better air permeability, low breathing resistance and comfortable wearing.

In addition, the PTFE membrane is naturally hydrophobic, and the filtration mechanism is physical and mechanical interception. The interception rate will not be attenuated due to moisture in the exhaled breath. Compared with ordinary melt-blown cloth masks, the protective effect of electrostatic adsorption is more stable and lasting.

? Products are widely used in various fields and are different from other manufacturers.

Our company can customize according to user’s requirements.

The optimized combination of key technical parameters such as speed ratio, pressure ratio, operating temperature, etc. can realize online control of air permeability, thickness and void ratio according to the ratio and pore-forming medium to meet the different requirements you need. .

Interested parties can enter the store for consultation.

</p

This article is from the Internet, does not represent 【www.buyfabric.net】 position, reproduced please specify the source.https://www.buyfabric.net/archives/33014

Author: clsrich

 
TOP
Home
News
Product
Application
Search