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Biaxially oriented film product ptfe base tape film



In industrial production filtration, filtration is often carried out, and the quality of the filter material often determines the quality of the product. Therefore, it is particula…

In industrial production filtration, filtration is often carried out, and the quality of the filter material often determines the quality of the product.

Therefore, it is particularly important to choose a high-quality and efficient filter material.

Here, the editor recommends to everyone the ptfe base tape film developed and produced by the company.

Suzhou New Material Technology Co., Ltd. is a fluorine material film manufacturer that integrates the research, development, production and sales of PTFE air filtration membranes, PTFE bubble point membranes, PTFE membranes, Teflon membranes and coated filter materials.

The company has advanced PTFE film production lines, lamination and composite production lines, which are at the domestic advanced level.

PTFE base tape film is made through special processes such as mixing, extrusion, extrusion, calendering, and biaxial stretching.

Due to the characteristics of ptfe fibrillation, when performing uniaxial stretching (i.e. longitudinal stretching), the ptfe polycrystalline aggregates begin to extend and form some fibrils. The fibrils are parallel to the stretching direction, and at the same time, the length of the fibrils Increase.

The cross-section of ptfe fibrils is wide and thin, its maximum width is about 100nm, and the smallest fibril is ?0.5??1.0nm.

The ptfe base film produced has strong hydrophobicity, chemical resistance, waterproofness and low wind resistance, and can achieve high dust removal efficiency. It can filter some very small particles with a diameter of 0.1um-0.3um. The level can reach H13-U16.

In addition, biaxially oriented film can undoubtedly achieve ultra-low emissions in intercepting various types of dust generated during the production process of the company, and it fully complies with current environmental protection standards.

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Author: clsrich

 
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