Buy Fabric Fabric News Clean room FFU filter membrane production level is high

Clean room FFU filter membrane production level is high



With the development of the economy and the improvement of people’s living standards, people’s requirements for product quality are getting higher and higher. The produ…

With the development of the economy and the improvement of people’s living standards, people’s requirements for product quality are getting higher and higher.

The production technology and production environment determine the quality of the product, which forces manufacturers to pursue better production technology and a higher production environment, and the clean room FFU filter membrane perfectly solves this problem.

Due to the particularity of the clean room, in addition to strict design, construction, and debugging, in order to ensure its safety during the production process, it must be equipped with high-efficiency filters to block some bacteria in the air. , particles and microorganisms, etc., thereby ensuring the quality of the product.

What is essential here is the clean room FFU filter membrane.

Polytetrafluoroethylene (PTFE) can also be called ptfe.

It is a new type of polymer compound polymerized from tetrafluoroethylene. The clean room filter material has excellent low temperature resistance, alkali resistance, hydrophobicity and non-adhesion, high porosity, small pore size and Uniform and other characteristics, the clean room FFU filter membrane can filter all dust particles including bacteria while ensuring air circulation, thereby achieving the purpose of advanced purification and ventilation.

Suzhou New Material Technology Co., Ltd. is a ptfe composite material manufacturer specializing in the research, development and production of FFU filter membranes for clean rooms. After years of painstaking research and research and development, the company not only has strong research and development capabilities, complete testing methods and The domestic advanced experimental equipment has also attracted a large number of outstanding technical talents.

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Author: clsrich

 
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