Buy Fabric Fabric News FFU dust-free workshop purification membrane controls pollution

FFU dust-free workshop purification membrane controls pollution



FFU dust-free workshop is the basis of pollution control. It controls airborne particulate concentration to achieve appropriate particulate cleanliness levels. The one that contrib…

FFU dust-free workshop is the basis of pollution control.

It controls airborne particulate concentration to achieve appropriate particulate cleanliness levels.

The one that contributes here is the FFU dust-free workshop purification membrane.

FFU dust-free workshop purification membrane has a node-fine fiber structure, forming hundreds of millions of micropores per unit area, which can effectively intercept dust in the air. It is very suitable for air purification fields, such as vacuum cleaner applications, air filtration membranes The high air permeability and high interception efficiency enable the vacuum cleaner to not only effectively intercept dust particles, with the highest accuracy reaching H14 level (99.995%) or above, but also allow the vacuum cleaner to maintain low energy consumption, and the material can be washed to restore performance and be reused. .

Because the micropore diameter is tens of thousands of times that of water molecules and hundreds of times smaller than water droplets, it has excellent moisture permeability, air permeability and waterproof properties.

It is currently the most widely used microporous organic membrane.

PTFE air filter membrane can be used in industry for high-temperature gas dust filtration and composite laminated fabrics.

Suzhou New Material Technology Co., Ltd. is a high-tech enterprise focusing on the research, development and production of FFU dust-free workshop purification membrane technology. The company adheres to the quality policy of “keep improving and strive for excellence” and continues to develop and produce products. Innovation, with its unique and stable performance, it occupies a dominant position in the market.

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Author: clsrich

 
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