The development of clean rooms is closely linked to modern industry and cutting-edge technology.
Due to the environmental requirements of the precision machinery industry (such as gyroscopes, micro bearings, etc. processing) and the semiconductor industry (such as large-scale integrated circuit production), the development of clean room filter material technology has been promoted.
Domestic statistics have shown that the pass rate of MOS circuit dies produced in an environment without clean level requirements is only 10% to 15%, and the 64-bit memory is only 2%.
Clean rooms are currently widely used in industries such as precision machinery, semiconductors, aerospace, and atomic energy.
? The clean room filter material has strong hydrophobicity, chemical resistance, waterproofness and low wind resistance, and can achieve high dust removal efficiency. For some extremely fine particles with a diameter of 0.1um-0.3um, the filtration grade Can reach H13-U16.
It can withstand acid and alkali corrosion in the entire PH value range under continuous operating temperature of 240°C and instantaneous temperature of 260°C, does not absorb moisture, and can withstand ultraviolet radiation.
? is a manufacturer specializing in R&D, production and sales.
It is also a provider specializing in technology development, transfer, consulting, and services in the field of new materials; R&D, production, sales, and customization; and high-efficiency separation and filtration material design solutions.
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